- Environmental Scanning Electron Microscope (ESEM), FEI Quanta 250 FEG;
- E-beam Lithography System, JC Nabity NPGS V9.1;
- Micromanipulators/Grippers, Kleindiek MM3A;
- ICP-RIE Plasma Etcher, SENTECH SI500;
- Multi-Function Scanning Probe Microscope (SPM), CSPM5500;
- Atomic Force Microscope (AFM), Agilent 5500;
- Atomic Force Microscope (AFM), NanoFirst 3000;
- Atomic Force Microscope (AFM), JPK Nano Wizard 3;
- Inverted Microscope, Olympus IX71;
- Contact Angle Measurement System, JGW-360A;
- True Color Confocal Microscope, Zeiss CSM700;
- Diffuse Reflectance Measurement System, QE-C2;
- Electrochemical Workstation, CHI660D;
- High Power Nd: YAG Nanosecond Laser system (wavelengths: 213nm, 266nm, 355nm, 532nm and 1064nm), INNOLAS SPITLIGHT 2000-10;
- High Power Nd: YAG Nanosecond Laser System (wavelengths: 355nm, 532nm and 1064nm), Thales SAGA 230-10 THC;
- Multi-beam He-Ne Laser Interference Simulation System, CVI 25-LHP-213-250;
- 532nm CW SLM DPSS Laser, CNI MSL-III-532-10mW;
- 671 nm CW SLM DPSS Laser, CNI MSL-FN-671-10mW;
- 473 nm CW SLM DPSS laser, CNI MSL-FN-473-10mW;
- 457nm CW SLM DPSS Laser, CNI MSL-FN-457-300mW;
- 532nm CW DPSS Laser, CNI MGL-F-532-1W;
- 808 nm CW Diode Laser, CNI MDL-III-808-2W;
- 655nm Laser Module, CNI PGL-DF-655 5mW;
- Fluorescence Spectrum Excitation Measurement Device, CNI;
- Laser Induced Breakdown Spectroscopy Experiment Device, CNI;
- End-pumped Laser Marking Machine, CNI EP10-1;
- Laser Power Meter, COHERENT SJG-100mW;
- Spectroscope, HORIBA IHR550;
- Auto Stage Controller (two-axis), SIGMA KOKI SHOT-302GS;
- Auto Micro-Stage, SIGMA KOKI SGSP26-100;
- High Precision Nano Stage, Newport XML350;
- Electronic Timer, GCI-73;
- Microplate Reader, 318C;
- Ultraviolet-Visible Ectrophotometer, UV2310Ⅱ;
- PH/mV Meter, Denver UB-7;
- Electronic Enalytical Balance, Denver TP-214;
- Inverted Fluorescence Microscope, DSY5000X;
- Spin Coater, KW-4A;
- Ultrasonic Cleaning Machine, RT400;
- Magnetic Stirrer, HJ-3;
- Precision Polishing Machine, UNIPOL-802;
