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LaserNaMi

Project Title: Laser Nanoscale Manufacturing (LaserNaMi)
Project No.: 247644
Project Funding: 347.4K Euros
Project Duration: 1 September 2010 – 31 August 2013
Program: FP7-PEOPLE-2009-IRSES
Funding Body: European Commission


Summary

The project “Laser Nanoscale Manufacturing (LaserNaMi)” focuses on staff exchanging between the partners, especially between the partners of EU and China, on the researching and developing new maskless laser nanoscale manufacturing technologies for low cost and high efficiency manufacturing of nano structured surfaces and components including periodic structures (nano gratings, anticounterfeiting security markers, nanoimprint templates, self-cleaning, antireflection surface nanostructures, and nano sensors) and other arbitrary features for both 2D and 3D applications. The target feature size will be down to ~10 nm in the selected applications for maskless laser nanoscale manufacturing.

The ultimate goal of LaserNaMi is to staff exchanging and knowledge sharing between the partners, especially between the partners of EU and China, on the researching and developing new laser nanoscale manufacturing technologies for low cost, simple and high speed manufacturing of nano structured surfaces and components including periodic and arbitrary features.

The project is divided into three inter-related workpackages: (1) Technology assessment and roadmapping, (2) Fundamental research on the modification of materials by laser nanofabrication, (3) Nanoscale fabrication. The workpackages integrate all activities that will lead to the completion of the ultimate goals of the project within 36 months.


Consortium

  • Optoelectronics Research Centre, Tampere University of Technology, Finland.
  • Institute for Research in Applicable Computing, University of Bedfordshire, UK.
  • School of Engineering, Cardiff University, UK.
  • Institute of Information Optical Engineering, Soochow University, China.
  • Centre for Nano Metrology and Manufacturing Technologies, Changchun University of Science and Technology, China.
  • Laboratory for Nanodevices and Thin Films National Centre for Nanoscience and Technology, China.
  • Chinese Academy of Sciences, Institute of Optics and Electronics, China.

Contacts

  • Prof. Tapio Niemi, Optoelectronics Research Centre (ORC), Tampere University of Technology (TTY), Finland (coordinator); Email: tapio.k.niemi@tut.fi
  • Dr Chunlei Tan, Optoelectronics Research Centre (ORC), Tampere University of Technology (TTY), Finland (coordinator); Email: Chunlei.Tan@tut.fi
  • Prof. Yong Yue, Institute for Research in Applicable Computing, University of Bedfordshire (UOB), UK; Email: yong.yue@beds.ac.uk
  • Dr Hanxing Zhu, School of Engineering, Cardiff University (CU), UK; Email: zhuh3@Cardiff.ac.uk
  • Prof. Changsi Peng, Institute of Information Optical Engineering, Soochow University (SUDA), China; Email: changsipeng@suda.edu.cn
  • Prof. Zuobin Wang, Centre for Nano Metrology and Manufacturing Technologies (CNM), Changchun University of Science and Technology (CUST), China; Eamil: WangZ@cust.edu.cn
  • Prof. Qian Liu, Laboratory for Nanodevices and Thin Films, National Centre for Nanoscience and Technology (NCNST), China; Email: liuq@nanoctr.cn
  • Dr Jin Zhang, Shaanxi Province Key Lab of Thin Films Technology and Optical Test, Xi'an Technological University (XATU), China; Email: zhangjin@xatu.edu.cn

 



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by Dr. Radut.